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Lasers for Microelectronics Applications (SE-Version)
THE ULTIMATE IN EXCIMER LASER TECHNOLOGY
Semiconductor processing, mask inspection, microlithography and metrology lasers are available which meet CE mark and SEMI S2 standards. All semiconductor excimer lasers use the latest total metal/ceramic technology for maximum laser lifetime with minimal service. SE-version excimer lasers feature clean room packaging, longer chamber lifetimes and longer gas lifetimes than standard excimer lasers.
SE-Version Features
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10 Billion pulse system lifetime |
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Guaranteed <1% stability |
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200 Million pulses on a single ArF 193nm gas fill |
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Hard anodize clean room package |
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Meets SEMI S2 standards |
The EX10SE Semiconductor Excimer Laser
SE Versions are available for EX10, EX50, EX100 and EX100H products.
EX10SE specifications
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PARAMETER
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F2 |
ArF
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KrF
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XeCl
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XeF
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Wavelength nm
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157 |
193
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248
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308
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351
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Energy Max. mJ
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3 |
20
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35
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15
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15
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Energy Control Range mJ
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1-3 |
5-20
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10-35
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7-15
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7-15
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Max. Stabilized Energy 200Hz
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2.5 |
15
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30
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15
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12
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Average power Max. W 300/600
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0.6/1.2 |
4/7
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6/12
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3/6
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3/6
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Stability standard deviation
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< 1% at max. repetition rate
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Repetition Rate, Hz
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300/600/1000
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Dynamic gas lifetime
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200E6 |
200E6
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500E6
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100E6
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300E6
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Static Gas Life to 50% energy
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15 days |
60 days
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90 days
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>1 Year
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90 days
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Pulse Length, ns
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12-15
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Beam Size, mm
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5X 3 |
8 X 3
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Divergence, mRad full angle
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1 X 2
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Cooling
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Air
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Optics Service |
500E6 |
300E6 |
1000E6 |
100E6 |
300E6 |
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