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MICRO LITHOGRAPHY MOPA SYSTEMS

EX5 and EX50 MOPA systems for Micro Lithography

High power highly line narrowed MOPA systems

Very high power MOPA and multiple laser systems

The EX5 and EX50 MOPA systems combine highly line narrowed operation with energy output. Line widths as low as 0.3pm with up to 20mJ at 193nm are possible in these lasers.

EX5A MOPA

PARAMETER ArF KrF
Wavelength, nm 193.36 248
Energy Max., mJ 5 10
Line width, pm <0.35 <0.35
Average Power @ 100Hz W 2.5 5
Average Power @ 2000Hz W 4.0 7
Repetition Rate Max. Hz          100/2000 and 4000
Dynamic gas lifetime Pulses to 50% energy* 5E6 10E6
Shelf life to 50% energy 3 days 10 days
Pulse Length nS 8        10
Stability <3% Standard Deviation
Tube Service Billions of Pulses
Beam Size, mm 3X 6
Divergence, mRad full angle 1 X 2
Cooling Water
Timing Jitter 2nS Standard Deviation
Weight 135kg

 

EX50 MOPA

PARAMETER ArF KrF
Wavelength, nm 193.36 248
Energy Max., mJ 15 25
Line width, pm <1PM <1PM
Average Power @ 500Hz W 8 15
Average Power @ 1000Hz W 12 20
Repetition Rate Max. Hz         500/1000*
Pulse Length nS 8        10
Stability <3% Standard Deviation
Tube Service 1000 Million Pulses
Beam Size, mm 4X 8
Divergence, mRad full angle 1 X 2
Cooling Air/Water
Timing Jitter 2nS Standard Deviation
Weight 200kg

 

Also available CO2 TEA MOPA to200W.

 

* Actual max repetition rate 999Hz.