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MICRO LITHOGRAPHY MOPA SYSTEMS
EX5 and EX50 MOPA systems for Micro Lithography
High power highly line narrowed MOPA systems
Very high power MOPA and multiple laser systems
The EX5 and EX50 MOPA systems combine highly line narrowed operation with
energy output. Line widths as low as 0.3pm with up to 20mJ at 193nm are possible
in these lasers.
EX5A MOPA
PARAMETER |
ArF |
KrF |
Wavelength, nm |
193.36 |
248 |
Energy Max., mJ |
5 |
10 |
Line width, pm |
<0.35 |
<0.35 |
Average Power
@ 100Hz W |
2.5 |
5 |
Average Power @
2000Hz W |
4.0 |
7 |
Repetition
Rate Max. Hz |
100/2000
and 4000 |
Dynamic gas lifetime
Pulses to 50% energy* |
5E6 |
10E6 |
Shelf life to 50% energy |
3
days |
10 days |
Pulse Length nS |
8
|
10 |
Stability |
<3% Standard Deviation |
Tube Service |
Billions of Pulses |
Beam Size, mm |
3X 6 |
Divergence, mRad full angle |
1 X 2 |
Cooling |
Water |
Timing Jitter |
2nS Standard
Deviation |
Weight |
135kg |
EX50 MOPA
PARAMETER |
ArF |
KrF |
Wavelength, nm |
193.36 |
248 |
Energy Max., mJ |
15 |
25 |
Line width, pm |
<1PM |
<1PM |
Average Power
@ 500Hz W |
8 |
15 |
Average Power @
1000Hz W |
12 |
20 |
Repetition
Rate Max. Hz |
500/1000* |
Pulse Length nS |
8
|
10 |
Stability |
<3% Standard Deviation |
Tube Service |
1000 Million Pulses |
Beam Size, mm |
4X 8 |
Divergence, mRad full angle |
1 X 2 |
Cooling |
Air/Water |
Timing Jitter |
2nS Standard
Deviation |
Weight |
200kg |
Also available CO2 TEA MOPA to200W.
* Actual max repetition rate 999Hz.
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